Spectroscopic Ellipsometry and Positron Annihilation Investigation of Sputtered HfO2 Films

分类： 物理学 >> 凝聚态:结构、力学和热性能 提交时间： 2017-03-26

Z. W. Ma L. X. Liu Y. Z. Xie Y. R. Su H. T. Zhao B. Y Wang X. Z. Cao X. B. Qin J. Li

摘要： Our results suggest that SE and PAS are effective techniques to study the optical and defect properties of HfO2 and the results provide insights for the fabrication of high-quality HfO2 thin films for optical application.

同行评议状态:待评议

 点击量 1779  下载量 984  评论